Self-Cleaning Properties of TiO2 Films Deposited by Reactive Magnetron Sputtering Using Smooth D.C. and Pulsed D.C. Source
he TiO2 films were prepared by reactive smooth d.c. and pulsed d.c. magnetron sputtering on glass slide substrates. A metallic titanium target was reactively sputtered in a mixture of argon and oxygen. The influence of smooth d.c. and pulsed d.c. discharge power on films thickness, crystallinity, surface morphology, photocatalytic activity (methylene blue degradation) and hydrophilic activity were studied. At pulsed d.c. sputtering, plasma generator has been used to provide the asymmetric pulsed d.c. bias of the target at 100 kHz and pulsed off-time 4016ns. The structures of the films at 100nm and 300nm thick showed nano-grain size structure. The pulsed d.c. mode deposition exhibited a considerably lower surface roughness, but higher grain size compared to the films deposited with the smooth d.c. mode. At film thickness about 300 nm, the XRD peaks indicated that the dominant structure was anatase for which the preferred orientation was in (101) plane. It did not show any definite change of phase between the films deposited in the smooth d.c. mode and the film deposited in the pulse d.c. mode. For the photocatalytic activity, it was clearly seen that the films deposited by smooth d.c. mode showed a higher photocatalytic activity. The hydrophilic activity test, after the films had been irradiated by an ultraviolet light source for 30 min., the smooth d.c. mode films (thickness 300 nm) showed that a water contact angle can be less than 10°. In this study, the TiO2 films of smooth d.c. mode sputtering could be applied for a self-cleaning glass application.
S. Pudwat et al., "Self-Cleaning Properties of TiO2 Films Deposited by Reactive Magnetron Sputtering Using Smooth D.C. and Pulsed D.C. Source", Advanced Materials Research, Vols. 55-57, pp. 453-456, 2008