Characterization of Anatase and Rutile TiO2 Thin Films Deposited by Two Cathodes Sputtering System

N. Witit-Anun; P. Rakkwamsuk; Pichet Limsuwan

doi:10.4028/www.scientific.net/AMR.55-57.469

Paper Titles

Self-Cleaning Properties of TiO₂ Films Deposited by Reactive Magnetron Sputtering Using Smooth D.C. and Pulsed D.C. Source
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Fabrication of Double Layers of Aramid Fiber/Alumina/Epoxy Resin Laminate Composite Using Low-Pressure Technique
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Fabrication of Ferroelectric Bismuth Titanate Glass-Ceramic by Incorporation Method
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The Influence of Total and Oxygen Partial Pressures on Structure and Hydrophilic Property of TiO₂Thin Films Deposited by Reactive DC Magnetron Sputtering
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Characterization of Anatase and Rutile TiO₂Thin Films Deposited by Two Cathodes Sputtering System
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Ferroelectric Glass-Ceramics from the PbO-Bi₂O₃-GeO₂ System
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Composites Base on Geopolymer Matrices: Preliminary Fabrication, Mechanical Properties and Future Applications
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High Capacity Packet Switching with a Soliton Pulse in a Nonlinear Micro Ring Resonator
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Attosecond Pulse and Beyond Generation Based on Multi-Stage Micro Ring Resonators
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 55-57Characterization of Anatase and Rutile TiO2 Thin...

Characterization of Anatase and Rutile TiO₂Thin Films Deposited by Two Cathodes Sputtering System

Abstract:

Titanium dioxide, TiO2, thin films were deposited on unheated Si (100) wafers by two cathodes sputtering system. However, during the deposition of TiO2 films only one cathode was used. A pure metallic titanium was used as a sputtering target. Argon and oxygen were used as sputtered gas and reactive gas, respectively. TiO2 films were deposited at the argon and oxygen ratio of 1:4 and a total pressure of 5.0 x 10-3 mbar. The distance between the target and the center point of substrate was 12 cm. For each deposition of TiO2 films, the position of substrate was changed every 2 cm on the radial position of the cathode. The deposition time for each deposition was 60 min. The films were characterized by X-ray diffraction (XRD) technique and transmission electron microscopy (TEM). The XRD results and TEM images show that the crystalline rutile TiO2 films can be successfully deposited on an unheated substrate.