Fabrication of Nanomechanical Resonators in Silicon Nitride

Abstract:

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We report our efforts towards fabricating nanomechanical resonators patterned by optical lithography in silicon nitride. Optical lithography has advantages of low cost and high efficiency over electron-beam lithography. Double clamped beam resonators with thickness 150nm, length and lateral dimensions 20um, 800nm have been designed. Through utilizing reactive ion etching and controlling gas flow, reaction time of CF4 and O2 plasma and power of the upper and lower electrode, nanomechanical resonators with lateral dimensions within 200nm are demonstrated.

Info:

Periodical:

Advanced Materials Research (Volumes 60-61)

Edited by:

Xiaohao Wang

Pages:

228-231

DOI:

10.4028/www.scientific.net/AMR.60-61.228

Citation:

M. Liu et al., "Fabrication of Nanomechanical Resonators in Silicon Nitride", Advanced Materials Research, Vols. 60-61, pp. 228-231, 2009

Online since:

January 2009

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Price:

$35.00

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