Fabrication of Nanomechanical Resonators in Silicon Nitride

Mei Liu; Jian Zhu; Shi Xing Jia; Min Zhuo; Le Lu; Quan Cheng Gong

doi:10.4028/www.scientific.net/AMR.60-61.228

Paper Titles

Single Neuron Adaptive PID Control of the Silicon-Based Integrated Micro Nano-Positioning XY-Stage
p.207

Modeling of Capacitive Microaccelerometers with Squeeze Film Damping and Electrostatic Effects Using Model Order Reduction
p.213

Real-Time and High-Performance Attitude and Heading Reference System Based on MIMU/Magnetometers
p.219

A Bulk RF MEMS Switch by Silicon-to-GaAs Bonding
p.224

Fabrication of Nanomechanical Resonators in Silicon Nitride
p.228

Investigation on Fine Polishing Technique of Silicon Wafer
p.232

Electrical Model of Inside Sense Outside Drive Frame Micro-Gyroscope Including Quadrature Error and Coriolis Offset
p.236

Advance of the Micro-Magnetometer MEMSMag Research
p.241

Fabrication and Sensing Properties of PSZT Thin Films for Micro-Force Sensors
p.246

HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 60-61Fabrication of Nanomechanical Resonators in...

Fabrication of Nanomechanical Resonators in Silicon Nitride

Abstract:

We report our efforts towards fabricating nanomechanical resonators patterned by optical lithography in silicon nitride. Optical lithography has advantages of low cost and high efficiency over electron-beam lithography. Double clamped beam resonators with thickness 150nm, length and lateral dimensions 20um, 800nm have been designed. Through utilizing reactive ion etching and controlling gas flow, reaction time of CF4 and O2 plasma and power of the upper and lower electrode, nanomechanical resonators with lateral dimensions within 200nm are demonstrated.