Chemical Structure of Fluorocarbon Films Deposited by Pulsed Plasma Thruster

Rui Zhang; Bing Li; Dai Xian Zhang; Fan Zhang; Jian Jun Wu

doi:10.4028/www.scientific.net/AMR.602-604.1465

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 602-604Chemical Structure of Fluorocarbon Films Deposited...

Chemical Structure of Fluorocarbon Films Deposited by Pulsed Plasma Thruster

Abstract:

Fluorocarbon films were deposited using a Pulsed Plasma Thruster. By means of mass spectrum analysis, the compositions of the Pulsed Plasma Thruster plume were studied. The microstructure and chemical bonding nature of the films were investigated by X-ray photoelectron spectroscopy. The plume consists primarily of C, F, CF, CF₂, CF₃, amounts of thruster body materials are detected as well. Five chemical bonds, CF₃, CF₂, CF, C-CF_x, and elemental carbon bonds are observed on the surface of all the deposited films, the content of the various chemical bonds change with deposited angle, the F/C ratio reaches a minimum value of 0.7643 at 15 degree, and increases gradually with deposited angle increasing from 15 degree to 60 degree.

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Periodical:

Advanced Materials Research (Volumes 602-604)

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1465-1469

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.602-604.1465

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Online since:

December 2012

Authors:

Rui Zhang*, Bing Li, Dai Xian Zhang, Fan Zhang, Jian Jun Wu

Keywords:

Fluorocarbon Film, Microstructure, Plume, Pulsed Plasma Thruster, XPS

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