p.1453
p.1457
p.1461
p.1465
p.1470
p.1474
p.1479
p.1484
p.1488
Research of Preparation and Etching of PS Microspheres Film
Abstract:
In this article, the polystyrene (PS) microspheres monolayer film was manufactured on silicon substrate by spin-coating, and the effect of PS microspheres concentration on preparation of monolayer film was discussed in detail. With a view to the application of graphic substrate technology, the etching effect with different technological parameter (etching time and power) was researched, and a set of appropriate process parameter were obtained, which met the requirements of preparation of the extension graphics silicon substrate.
Info:
Periodical:
Pages:
1470-1473
Citation:
Online since:
December 2012
Authors:
Keywords:
Price:
Сopyright:
© 2013 Trans Tech Publications Ltd. All Rights Reserved
Share:
Citation: