Research of Preparation and Etching of PS Microspheres Film

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Abstract:

In this article, the polystyrene (PS) microspheres monolayer film was manufactured on silicon substrate by spin-coating, and the effect of PS microspheres concentration on preparation of monolayer film was discussed in detail. With a view to the application of graphic substrate technology, the etching effect with different technological parameter (etching time and power) was researched, and a set of appropriate process parameter were obtained, which met the requirements of preparation of the extension graphics silicon substrate.

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Advanced Materials Research (Volumes 602-604)

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1470-1473

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December 2012

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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