Flow Characteristics for High-Speed Scanning in Immersion Lithography

Hui Chen; Heng Du; Su Mei Chen

doi:10.4028/www.scientific.net/AMR.622-623.869

Paper Titles

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The Effect of Growth Time on the Morphology of ZnO Nanorods by Hydrothermal Method
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Synthesis and Characterization of Porous Nano-Crystalline Barium Hexaferrite
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Green Synthesis of Silver Nanoparticles Using a Vitamin C Rich Phyllanthus emblica Extract
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Flow Characteristics for High-Speed Scanning in Immersion Lithography
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Migration of Silicon from Nanocomposite Packaging Materials into Acidic Food Simulant
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Detection of Silver Nanoparticles Internalization into Petunia, Petunia hybrida, Isolated Protoplasts
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N-Loaded TiO₂ for Photocatalytic Degradation of Methyl Orange under Visible Light Irradiation
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Surface Modification of Silver Nanoparticles in Phase Change Materials for Building Energy Application
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Flow Characteristics for High-Speed Scanning in Immersion Lithography

Abstract:

High-speed scanning is an effective way to improve the throughput of immersion lithography with double patterning, especially when the critical dimension is less than 32-nm. But it makes more complex characteristics of immersion flow. In this paper, considering the extreme speed of wafer scanning, the model is developed to investigate the characteristics of immersion flow, including the velocity vector, pressure distribution, renovation efficiency and so on. Finally, the optimized parameters and methods to effective liquid renovation are proposed when the wafer scans at high-speed.