Exposure Schedule for Uniform Diffraction Efficiency of Partially-Overlapping Multiple Holograms in Dual Monomers Photopolymers

Wei Song; Shi Quan Tao; Da Yong Wang; Yun Xin Wang; Lisa Marx

doi:10.4028/www.scientific.net/AMR.652-654.638

Paper Titles

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Preparation and Research on Luminescent Properties of Eu-Doped TiO₂-ZnO Composite Powders
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Preparation of CsI(Tl) Scintillation Film by RF Magnetron Sputter Method and its Structural and Optical Characterization
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Study on Y₃Al₅O₁₂:Eu³⁺ Phosphor Coated by Bi₂O₃
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Exposure Schedule for Uniform Diffraction Efficiency of Partially-Overlapping Multiple Holograms in Dual Monomers Photopolymers
p.638

Fabrication of Silicon Nanowires by Electroless Etching for Thermoelectric Application
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The Growth and Optical Properties of CdS Nanorods via Solvent-Thermal Route
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Characteristics of Silicon Nanowire Field Electron Emission
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The Study of Au/TiO₂/Au Resistive Switching Memory with Crosspoint Structure
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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 652-654Exposure Schedule for Uniform Diffraction...

Exposure Schedule for Uniform Diffraction Efficiency of Partially-Overlapping Multiple Holograms in Dual Monomers Photopolymers

Abstract:

The exposure schedule model of uniform diffraction efficiency in single monomer photopolymer is extended to that in dual monomers with partially-overlapping multiplexing methods. The proposed model can be thought of solving an optimization problem. The exposure schedule for 51 holograms are calculated and verified by the numerical simulation. The result shows that the exposure schedule is effective to produce the uniform diffraction efficiency for the multiplexing holographic storage.