The Study of Au/TiO2/Au Resistive Switching Memory with Crosspoint Structure

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Abstract:

This paper presets a process of fabrication and measurements of Au/TiO2/Au resistive switching memory. The device was fabricated using crosspoint structure, and the electrode width and TiO2 film of which are 1 µm and 50 nm. According to our experimental result, resistive switching cells exhibit good stability and reliability with bipolar resistive switching behavior.

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Advanced Materials Research (Volumes 652-654)

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659-663

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January 2013

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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