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The Study of Au/TiO2/Au Resistive Switching Memory with Crosspoint Structure
Abstract:
This paper presets a process of fabrication and measurements of Au/TiO2/Au resistive switching memory. The device was fabricated using crosspoint structure, and the electrode width and TiO2 film of which are 1 µm and 50 nm. According to our experimental result, resistive switching cells exhibit good stability and reliability with bipolar resistive switching behavior.
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659-663
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Online since:
January 2013
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© 2013 Trans Tech Publications Ltd. All Rights Reserved
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