Electrical and Structural Properties of ZnO/TiO₂ Nanocomposite Thin Films by RF Magnetron Co-Sputtering

Abstract:

In this study, the ZnO/TiO2 nanocomposite thin films were prepared by RF Magnetron co-sputtering ZnO and TiO2 targets at different deposition times from 30-75 minutes. The electrical and structural properties ZnO/TiO2 nanocomposite thin films were characterized by I-V measurement, atomic force microscopy (AFM) and field emission scanning electron microscopy (FE-SEM). The electrical characteristics of nanocomposite films revealed that the conductivity of thin films increases as the thickness increase due to the improvement in surface contact between particles as well as photocatalytic activity. High conductivity at 1.67x10-4 S/cm and lowest resistivity about 5.14x104 Ω/cm were obtained for 75 minutes deposition time. Atomic force microscopy (AFM) showed particle size of ZnO/TiO2 thin films varied from 27nm to 51nm with an increasing in deposition time with granular shapes structures were observed from field emission scanning electron microscopy (FE-SEM).

• Periodical: Advanced Materials Research (Volume 667)
• Pages: 206-212
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.667.206
• Online since: March 2013
• Authors: I. Saurdi, Mohamad Hafiz Mamat, Mohamad Rusop
• Keywords: Deposition Time, Electrical Properties, Magnetron Sputtering, Titanium Oxide, Zinc Oxide (ZnO)

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