Novel Design and Fabrication of High Sensitivity MEMS Capacitive Sensor Array for Fingerprint Imaging
A novel MEMS capacitive pressure sensor array is designed and fabricated for fingerprint acquisition application. Based on analytical investigations and FEM analysis, the designed structure of pressure sensor cells assist from an aluminum clamped-clamped wide beam as the movable electrode of variant capacitor, instead of usual membrane structure. A rectangular base T-shape protrusion is also used on top of the deflecting electrode to concentrate pressure and increase the sensitivity. Proven by the real test of the fabricated sensor structure, this design has enhanced sensitivity and linearity of the device compared to all membrane based reported prototypes without crossing the dpi limits. Structural modifications have resulted in a simpler fabrication process as well.
Selin Teo, A. Q. Liu, H. Li and B. Tarik
M. Damghanian and B. Y. Majlis, "Novel Design and Fabrication of High Sensitivity MEMS Capacitive Sensor Array for Fingerprint Imaging", Advanced Materials Research, Vol. 74, pp. 239-242, 2009