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Effects of the Deposition Temperature on the Structure and Solar Control Performance of TiN Coatings Prepared by APCVD

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Abstract:

Titanium nitride coatings were prepared on common glass slides using TiCl4 and NH3 by atmospheric pressure chemical vapor deposition. The deposition temperature range from 450-650 °C was applied. X-ray diffraction, scanning electron microscope, energy dispersive X-ray Spectrometer, four-point probe sheet resistance instrument and UV-Vis spectrometer were employed to characterize the obtained coatings. The crystallization and electrical conductivity of the coatings was improved with increasing deposition temperature. The reflectance and transmittance spectra showed all the coatings exhibited solar control performance. The coating prepared at 650 °C presented the optimum solar control performance in the present study.

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Periodical:

Advanced Materials Research (Volumes 79-82)

Pages:

755-758

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.79-82.755

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Online since:

August 2009

Authors:

Gang Feng Duan, Gao Ling Zhao, Xiao Xuan Lin, Gao Rong Han

Keywords:

Atmospheric Pressure Chemical Vapor Deposition, Deposition Temperature, Solar Control, Titanium Nitride

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© 2009 Trans Tech Publications Ltd. All Rights Reserved

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