Deposition of Fluorocarbon Thin Films on Polypropylene Substrate by RF Magnetron Sputtering

Yu Hui Zhang; Quan Ji; Wen Fei Chen

doi:10.4028/www.scientific.net/AMR.79-82.875

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 79-82Deposition of Fluorocarbon Thin Films on...

Deposition of Fluorocarbon Thin Films on Polypropylene Substrate by RF Magnetron Sputtering

Abstract:

Radio frequency (rf) magnetron sputtering of polytetrafluoroethylene (PTFE) using argon as the working gas was used to prepare hydrophobic fluorocarbon films on a polypropylene substrate. The morphology, structure and hydrophobicity of the fluorocarbon films were analyzed by means of SEM, AFM, XPS and contact angle determination. The growth pattern in this system was a typical one-dimensional (1-D) Volmer-Weber growth mode. The films demonstrated dependence of structure and hydrophobicity on the conditions of preparation. The contact angle decreased with increasing discharge power and increased with increasing pressure. Those trends are attributed to the presence of differing proportions of -CF3, -CF2-, -CF-, and -C- in fluorocarbon thin films prepared with different energy.

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Advanced Materials Research (Volumes 79-82)

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875-878

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.79-82.875

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Online since:

August 2009

Authors:

Yu Hui Zhang, Quan Ji, Wen Fei Chen

Keywords:

Contact Angle (CA), PTFE, RF Magnetron Sputtering, Surface Morphology, Surface Structure

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