The Ferroelectric Field Effect Transistor Simulation and Analysis

Article Preview

Abstract:

A ferroelectric field effect transistor (FFET) with the metal/ferroelectric/ semiconductor (MFS) structure is designed and simulated. The simulation results show that the drain current at Vg=0 after polarized is decided by Pr and Pr/Ps. When increasing Pr, Id enhanced. When Pr/Ps decreases, Id increases if the FFET is saturated. When a voltage (Vp=1.5v) is applied on the FFET, Id may be stable and not sensitive to the variation of Pr/Ps. This FFET stable output voltage is decided by Ec.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

850-854

Citation:

Online since:

December 2013

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2014 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

* - Corresponding Author

[1] Scott J F: Ferroelectrics (Springer USA 2000), p.241.

Google Scholar

[2] Zhang L L, Feng Y J, Xu Z, et al: Chinese Science Bulletin, Vol. 54(2009), No. 19, p.3489, (In Chinese).

Google Scholar

[3] Hiroshi Ishiwara: Current Applied Physics, Vol. 9 (2009), p. S2.

Google Scholar

[4] DAI Zhonghua, YAO Xi, etc: Chinese Science Bulletin, Vol. 51(2006), No. 8, p.1000.

Google Scholar

[5] Yan Lei, Tang Tingao, Huang Weining, et al: Chinese Journal of Semiconductors, Vol. 21 (2000), No. 12, p.1203 (in Chinese).

Google Scholar

[6] Miller S L Nasby R D Schwank J R et al: J Appl Phys, Vol. 68(1990), No. 12, p.6463.

Google Scholar

[7] Wang Hua, Ren Ming-Fang: Acta Phys. Sin. Vol. 55(2006), No. 3, p.1512.

Google Scholar

[8] Wang Qiang, Shen Ming-Rong etc: Acta Physica Sinica Vol. 53(2004), No. 7, p.2373.

Google Scholar

[9] Sung-MinYoon., HiroshiIshiwara: IEEE2000, 13(6), p.1.

Google Scholar