p.825
p.831
p.837
p.845
p.850
p.855
p.861
p.865
p.871
The Ferroelectric Field Effect Transistor Simulation and Analysis
Abstract:
A ferroelectric field effect transistor (FFET) with the metal/ferroelectric/ semiconductor (MFS) structure is designed and simulated. The simulation results show that the drain current at Vg=0 after polarized is decided by Pr and Pr/Ps. When increasing Pr, Id enhanced. When Pr/Ps decreases, Id increases if the FFET is saturated. When a voltage (Vp=1.5v) is applied on the FFET, Id may be stable and not sensitive to the variation of Pr/Ps. This FFET stable output voltage is decided by Ec.
Info:
Periodical:
Pages:
850-854
Citation:
Online since:
December 2013
Authors:
Keywords:
Price:
Сopyright:
© 2014 Trans Tech Publications Ltd. All Rights Reserved
Share:
Citation: