Characteristics of Cuprous Oxide Thin Films Deposited on Glass and Polyethylene Terephthalate Substrates

Poh Kok Ooi; Chin Guan Ching; Sha Shiong Ng; Mat Johar Abdullah; Abu Hassan Haslan; Hassan Zainuriah

doi:10.4028/www.scientific.net/AMR.895.29

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 895Characteristics of Cuprous Oxide Thin Films...

Characteristics of Cuprous Oxide Thin Films Deposited on Glass and Polyethylene Terephthalate Substrates

Abstract:

In this work, cuprous oxide (Cu₂O) thin films grown on glass and polyethylene terephthalate (PET) substrates using reactive radio frequency magnetron sputtering system were investigated. Copper target with purity of 99.99% were used while high purity argon-oxygen gases were utilized as sputtering gases. Structural, morphological, and optical properties of the films were investigated by X-ray diffraction (XRD), atomic force microscopy and ultra-violet visible spectrophotometer. From the XRD results, only one single diffraction peak corresponding to cubic Cu₂O (111) crystal structure were observed for both substrates. The surface morphologies of the samples were in a form of pillar-like. Root mean square surface roughness for Cu₂O on glass and PET substrates were 3.37 nm and 3.20 nm, respectively. The films were highly transparent for wavelength above 600 nm. The Cu₂O films have direct band gap values of around 2.56 eV as determined by Taucs method.

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Advanced Materials Research (Volume 895)

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29-34

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.895.29

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Online since:

February 2014

Authors:

Poh Kok Ooi*, Chin Guan Ching, Sha Shiong Ng, Mat Johar Abdullah, Abu Hassan Haslan, Hassan Zainuriah

Keywords:

Cuprous Oxide, Polyethylene Terephthalate, Radio Frequency Magnetron Sputtering

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