Variable Frequency Microwave Curing of SU8 Photoresist Films

Christian Antonio; Piyachat Watanachai

doi:10.4028/www.scientific.net/AMR.931-932.101

Paper Titles

Synthesis of New Bio-Based Thermoset Resin from Palm Oil
p.78

Rheological Properties and Extrudate Swell of PHBV-Bagasse Composites
p.83

Novel Method for Recycle Epoxy Resin from Waste Printed Circuit Board
p.90

Analytical Model for Effect of Polymer Composite Membrane Properties on Direct Methanol Fuel Cell Performance
p.95

Variable Frequency Microwave Curing of SU8 Photoresist Films
p.101

Enhancing the Flexural and Impact Properties of Bioplastic Poly(lactic acid) by Melt Blending with Poly(butylene succinate)
p.106

Carvacrol as an Antimicrobial Agent for Poly(butylene succinate): Tensile Properties and Antimicrobial Activity Observations
p.111

Effect of Sr Doped La₄Ni₃O_10±δ as a Cathode for IT-SOFC
p.116

Electrical Conduction Mechanisms in n-CdS/p-CuFeO₂ Heterojunction Diode
p.122

HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 931-932Variable Frequency Microwave Curing of SU8...

Variable Frequency Microwave Curing of SU8 Photoresist Films

Abstract:

Photoresist used in the fabrication of Microelectrochemical Systems (MEMS) has traditionally been processed using conventional curing technology. This type of curing is often time intensive and results in non-uniform products. A uniform bake of the layer is not always possible due to the mechanisms of heat transfer conventional curing offers, leading to poor pattern resolution, formation of micro-cracks and severe outgassing occurring as a consequence. The Variable Frequency Microwave (VFM) Technique was successfully utilised in this study as an alternative method for the processing of negative tone SU8 photoresist. The VFM method was compared to the conventional processing method, which utilises a Hotplate, and a hybrid method utilizing both Hotplate and the VFM and found that an increase on the degree of cure was observed using the VFM at similar processing temperatures which means that SU8 curing at lower temperatures or rapid curing is possible. The increase in cure rates can be attributed to a combination of heat transfer and the unique capability of microwave to couple with the sample. Optical studies of the microstructures fabricated suggest that films that have a degree of cure of <60% resulted in poor quality microstructures. The VFM was found to achieve satisfactory microstructures at most of the temperatures tested as compared to the other two methods tested.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Advanced Materials Research (Volumes 931-932)

Pages:

101-105

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.931-932.101

Citation:

Cite this paper

Online since:

May 2014

Authors:

Christian Antonio, Piyachat Watanachai*

Keywords:

MEMS, Microwave, Photoresist, SU8, VFM

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

* - Corresponding Author

References

[1] N. LaBianca, J. Gelorme, K. Lee, E. Cooper, E. O'Sullivan, J. Shaw, High Aspect Ratio Optical Resist Chemistry for MEMs Application, Electrochem. Soc. Proc. 95-18 (1993) 386-396.

Google Scholar

[2] C.A. Everleigh, A.C. Johnson, R.J. Espinosa, R.S. Garard, Use of High-Power Traveling Wave Tubes as a Microwave Heating Source, Mater. Res. Soc. Symp. Proc. 347 (1994) 79-89.

DOI: 10.1557/proc-347-79

Google Scholar

[3] R. Feng, R.J. Farris, Influence of Processing Conditions on the Thermal and Mechanical Properties of SU8 Negative Photoresist Coatings, J. Micromech. Microeng. 13 (2003) 80-88.

DOI: 10.1088/0960-1317/13/1/312

Google Scholar