Effects of Misalignment of Parallel Beam Optics on Thin Film Stress Analysis

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Abstract:

Collecting reliable data is crucial in the research of residual stresses in thin films using X-ray diffraction. The parallel beam geometry has advantage of reliability compared to focusing beam geometry. Though care must be taken to the alignment. A small alignment error may cause a significant error in the stress value. We will show the sensitivity for the misalignment of the parallel beam optics, discuss requirements on hardware alignment and demonstrate a software correction for the presence of remaining hardware errors.

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