The Effect of Implant Temperature and Pre-Annealing on Defect Formation after Laser Thermal Processing

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Periodical:

Defect and Diffusion Forum (Volumes 200-202)

Edited by:

D.J. Fisher

Pages:

145-152

DOI:

10.4028/www.scientific.net/DDF.200-202.145

Citation:

H.B. Banisaukas et al., "The Effect of Implant Temperature and Pre-Annealing on Defect Formation after Laser Thermal Processing", Defect and Diffusion Forum, Vols. 200-202, pp. 145-152, 2002

Online since:

November 2001

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$35.00

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