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Formulation of Impurity-Vacancy Pair Formation Energy in Fast Diffusion

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Abstract:

In fast diffusion, the impurity diffusion coefficient is much greater than the self-diffusion coefficient. The pair mechanism is here considered to explain fast diffusion. Formulations for the formation of the pair are based upon pseudopotential theory.

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Defects and Diffusion in Metals XII View Preview

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Periodical:

Defect and Diffusion Forum (Volumes 305-306)

Pages:

49-53

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.305-306.49

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Cite this paper

Online since:

October 2010

Authors:

Amitava Ghorai

Keywords:

Fast Diffusion, FCC Metals, Interstitial, Model Pseudopotential, Point Defect, Vacancy

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© 2010 Trans Tech Publications Ltd. All Rights Reserved

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