Diffusion of Implanted Tellurium-121 into Silicon

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Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Edited by:

M. Koiwa, K. Hirano, H. Nakajima and T. Okada

Pages:

949-954

DOI:

10.4028/www.scientific.net/DDF.95-98.949

Citation:

F. Rollert et al., "Diffusion of Implanted Tellurium-121 into Silicon", Defect and Diffusion Forum, Vols. 95-98, pp. 949-954, 1993

Online since:

January 1993

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Price:

$35.00

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