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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 95-98Diffusion of Implanted Tellurium-121 into Silicon

Diffusion of Implanted Tellurium-121 into Silicon

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Diffusion in Materials - DIMAT 1992

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Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Pages:

949-954

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.95-98.949

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Online since:

January 1993

Authors:

F. Rollert, Nicolaas Stolwijk, Helmut Mehrer

Keywords:

Diffusion in Silicon, Ion Implantation, Kick-Out Mechanism, Te Tracer Diffusion

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© 1993 Trans Tech Publications Ltd. All Rights Reserved

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