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Behavior of Self-Interstitials and Vacancies in Silicon

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Periodical:

Defect and Diffusion Forum (Volumes 95-98)

Pages:

961-966

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.95-98.961

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Online since:

January 1993

Authors:

Takahisa Okino

Keywords:

Impurity Diffusion, Self-Interstitial, Silicon, Vacancy

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© 1993 Trans Tech Publications Ltd. All Rights Reserved

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