Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering

Elvira Fortunato; Patrícia Nunes; António Marques; Daniel Costa; Hugo Águas; Isabel Ferreira; Maria Elisabete V. Costa; Rodrigo Martins

doi:10.4028/www.scientific.net/KEM.230-232.571

Paper Titles

Transparent and Antiglare Conducting Coatings Deposited by Wet Chemical Processes
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Role of the Density of States in the Colour Selection of the Collection Spectrum of Amorphous Silicon-Based Schottky Photodiodes
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Optical and Photoelectric Properties of PZT Films for Microelectronic Applications
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Influence of Different Unheated Substrates on the Properties of ITO Thin Films Deposited by rf-PERTE
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Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering
p.571

The Study of Dipolar and Space Charges in Semicrystalline Polymers
p.575

Very Low Frequency Dielectric Relaxation Deduced from Time Domain Measurements
p.579

Influence of the Plasma Regime on the Structural, Optical and Transport Properties of a-Si:H Thin Films
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Role of the i-Layer Thickness in the Performance of a-Si:H Schottky Barrier Photodiodes
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Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering

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Periodical:

Key Engineering Materials (Volumes 230-232)

Pages:

571-574

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.230-232.571

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Online since:

October 2002

Authors:

Elvira Fortunato, Patrícia Nunes, António Marques, Daniel Costa, Hugo Águas, Isabel Ferreira, Maria Elisabete V. Costa, Rodrigo Martins

Keywords:

Polymer Substrate, Sputtering, Transparent Conducting Films, ZnO:Al

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References

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