Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering

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Periodical:

Key Engineering Materials (Volumes 230-232)

Edited by:

Teresa Vieira

Pages:

571-574

DOI:

10.4028/www.scientific.net/KEM.230-232.571

Citation:

E. Fortunato et al., "Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering", Key Engineering Materials, Vols. 230-232, pp. 571-574, 2002

Online since:

October 2002

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$35.00

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