Influence of the Plasma Regime on the Structural, Optical and Transport Properties of a-Si:H Thin Films

Hugo Águas; Rodrigo Martins; Elvira Fortunato

doi:10.4028/www.scientific.net/KEM.230-232.583

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Influence of the Plasma Regime on the Structural, Optical and Transport Properties of a-Si:H Thin Films

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Periodical:

Key Engineering Materials (Volumes 230-232)

Pages:

583-586

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.230-232.583

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Online since:

October 2002

Authors:

Hugo Águas, Rodrigo Martins, Elvira Fortunato

Keywords:

Amorphous Silicon, Ion Bombardment, Langmuir Probe, PECVD, Plasma Regime

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