A Study on the Dressing Rate in CMP Pad Conditioning

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Periodical:

Key Engineering Materials (Volumes 257-258)

Edited by:

Thomas Pearce, Yongsheng Gao, Jun'ichi Tamaki and Tsunemoto Kuriyagawa

Pages:

377-382

DOI:

10.4028/www.scientific.net/KEM.257-258.377

Citation:

P. L. Tso and S.Y. Ho, "A Study on the Dressing Rate in CMP Pad Conditioning", Key Engineering Materials, Vols. 257-258, pp. 377-382, 2004

Online since:

February 2004

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$35.00

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