Polycrystalline Silicon Thin Films on SiC Substrates for Solar Cells
The thin-film of silicon deposited by RTCVD on pressureless sintered SiC substrate with the size of 30mm×20mm, which is cleaned by ultrasonic method and chemical treatment. The crystal size of silicon columnar grain can reach 190 µm and its preferred orientation is  after ZMR process.
Wei Pan, Jianghong Gong, Chang-Chun Ge and Jing-Feng Li
H. F. Li et al., "Polycrystalline Silicon Thin Films on SiC Substrates for Solar Cells", Key Engineering Materials, Vols. 280-283, pp. 1147-1148, 2005