Preparation of Epitaxial LiTaO3 Thin Films by Metal Organic Chemical Vapor Deposition and its Electrical and Optical Properties

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Epitaxial LiTaO3 thin films were deposited on epitaxial Pt(111)/Al2O3(001) and Al2O3(001) substrates by metal organic chemical vapor deposition using LiTa(OC2H5)4(OC2H4OCH3)2 and Li(DPM) precursors. The full-width at half-maximum of the rocking curve of LiTaO3 thin films were respectively 0.29° on Al2O3(001) substrates and 0.98° on epitaxial Pt(111)/Al2O3(001). Electrical measurements showed that the remanent polarization and coercive field of the films were 2Pr=76 μC/cm2 and E =130 kV/cm, respectively. The leakage current density was 10-6–10-8 A/cm2 at 120 kV/cm. Refractive indices n measured at 632.8 nm were measured respectively as 2.15 on Al2O3(001) and 2.14 on Pt(111)/Al2O3(001).

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Periodical:

Edited by:

Keiichi Katayama, Kazumi Kato, Tadashi Takenaka, Masasuke Takata and Kazuo Shinozaki

Pages:

57-60

DOI:

10.4028/www.scientific.net/KEM.320.57

Citation:

T. Yamamoto et al., "Preparation of Epitaxial LiTaO3 Thin Films by Metal Organic Chemical Vapor Deposition and its Electrical and Optical Properties", Key Engineering Materials, Vol. 320, pp. 57-60, 2006

Online since:

September 2006

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$35.00

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