Impurity Contamination and Diffusion during Annealing in Implanted ZnO

Isao Sakaguchi; Yutaka Adachi; Takeshi Ogaki; Kenji Matsumoto; Shunichi Hishita; Hajime Haneda; Naoki Ohashi

doi:10.4028/www.scientific.net/KEM.388.23

Paper Titles

Effect of Annealing on Electrical Degradation Characteristics of ZnO Varistors
p.7

Study on Recovery of Electrical Degradation of ZnO Varistors
p.11

Electrical Degradation Caused by Electro-Static Discharge Pulse in ZnO-Based Multilayer Varistor
p.15

Photoluminescence from ZnO Thin Film Deposited on R-Plane Sapphire Substrate by RF Magnetron Sputtering
p.19

Impurity Contamination and Diffusion during Annealing in Implanted ZnO
p.23

Synthesis of Well-Aligned ZnO Nanowhisker Films Using Aqueous Solution for Use in Dye-Sensitized Sensor
p.27

High-Rate Charge-Discharge Performance of Composite Electrodes of FeOOH-Based Amorphous Particles and Carbon Powder
p.33

Fabrication of Titanate Thin Film by Electrophoretic Deposition of Tetratitanate Nanosheets for Electrodes of Li-Ion Battery
p.37

Effects of Lattice Defects on Cathode Properties of LiMn₂O₄Synthesized at Low Temperatures for Lithium Ion Secondary Battery
p.41

HomeKey Engineering MaterialsKey Engineering Materials Vol. 388Impurity Contamination and Diffusion during...

Impurity Contamination and Diffusion during Annealing in Implanted ZnO

Abstract:

The effect of ion implantation leading to contamination and diffusion of lithium impurity in ZnO ceramics substrates was investigated. The diffusion coefficients of Li in the implanted ZnO annealed at 1000 and 850°C were in good agreement with those in the non-implanted ZnO. At 700°C, Li diffusion in the implanted ZnO was strongly enhanced. Our results show that the defects introduced by the implantation enhance the impurity diffusion at low temperature annealing.

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Key Engineering Materials (Volume 388)

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23-26

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.388.23

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Online since:

September 2008

Authors:

Isao Sakaguchi, Yutaka Adachi, Takeshi Ogaki, Kenji Matsumoto, Shunichi Hishita, Hajime Haneda, Naoki Ohashi

Keywords:

Contamination, Diffusion, Ion Implantation, Lithium, Secondary Ion Mass Spectroscopy (SIMS), Zinc Oxide (ZnO)

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