Observation of Diffusion Behavior in Al-Implanted ZnO Single Crystal

Abstract:

Article Preview

Diffusion behaviors of aluminum (Al) in zinc-oxide (ZnO) single crystals were measured by means of ion implantation technique and SIMS depth profiling. It was found that Al concentration profile had a peculiar shape with a constant-concentration region and a steep tail, which was also found in profiles of other donors such as Ga and In. Detailed analysis of the profiles revealed that the diffusivity of Al was proportional to the square of Al concentration and its intrinsic diffusivity was much smaller than previously reported values. Oxygen diffusion experiments were also performed and the implantation of Al ions enhanced the oxygen diffusion coefficients by about 20 times. This result indicates that oxygen interstitial diffusion occurs in n-type ZnO.

Info:

Periodical:

Key Engineering Materials (Volumes 421-422)

Edited by:

Tadashi Takenaka, Hajime Haneda, Kazumi Kato, Masasuke Takata and Kazuo Shinozaki

Pages:

197-200

DOI:

10.4028/www.scientific.net/KEM.421-422.197

Citation:

T. Nakagawa et al., "Observation of Diffusion Behavior in Al-Implanted ZnO Single Crystal", Key Engineering Materials, Vols. 421-422, pp. 197-200, 2010

Online since:

December 2009

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.