ZnO Films Growth at Different Temperature on the Substrate of Corning Glass by MOCVD

W. Tang; X. Yang; C. Wang; C. Zhao; X. Gao; J. Yang; B. Liu; H. Liang; Jie Zhao; J. Sun; G. Du

doi:10.4028/www.scientific.net/KEM.428-429.447

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HomeKey Engineering MaterialsKey Engineering Materials Vols. 428-429ZnO Films Growth at Different Temperature on the...

ZnO Films Growth at Different Temperature on the Substrate of Corning Glass by MOCVD

Abstract:

We deposited ZnO films on Corning glass substrate by metal-organic chemical vapor deposition (MOCVD). We found the diffraction (002) peak at ~34.46°, indicating that the ZnO thin films were C-oriented. ZnO films were highly transparent with a transmission ratio larger than 85% in the visible range. The surface morphology of the films was observed by atomic force microscopy (AFM).

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Key Engineering Materials (Volumes 428-429)

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447-449

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.428-429.447

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Online since:

January 2010

Authors:

W. Tang, X. Yang, C. Wang, C. Zhao, X. Gao, J. Yang, B. Liu, H. Liang, Jie Zhao, J. Sun, G. Du

Keywords:

Glass, Growth, MOCVD, Thin Film, Zinc Oxide (ZnO)

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