ZnO Films Growth at Different Temperature on the Substrate of Corning Glass by MOCVD

Abstract:

Article Preview

We deposited ZnO films on Corning glass substrate by metal-organic chemical vapor deposition (MOCVD). We found the diffraction (002) peak at ~34.46°, indicating that the ZnO thin films were C-oriented. ZnO films were highly transparent with a transmission ratio larger than 85% in the visible range. The surface morphology of the films was observed by atomic force microscopy (AFM).

Info:

Periodical:

Key Engineering Materials (Volumes 428-429)

Edited by:

Yuan Ming Huang

Pages:

447-449

DOI:

10.4028/www.scientific.net/KEM.428-429.447

Citation:

W. Tang et al., "ZnO Films Growth at Different Temperature on the Substrate of Corning Glass by MOCVD", Key Engineering Materials, Vols. 428-429, pp. 447-449, 2010

Online since:

January 2010

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.