Sub Micron Poly-Dimethyl Siloxane (PDMS) Replication Using Proton Beam Fabricated Nickel Moulds
We present a process to fabricate Ni moulds on proton beam written (PBW) PMMA structures. These Ni mould are use to replicate PDMS lab on a chip devices featuring 300 nm details of high verticality, smooth sidewalls and high aspect ratios. The lifespan of the Ni mould can be extended and the functionality improved by means of introducing a 5 nm thick Teflon AF release layer. Following this method, PDMS chips have been fabricated for microfluidic experiments.
Jianhong Zhao, Masanori Kunieda, Guilin Yang and Xue-Ming Yuan
P. G. Shao et al., "Sub Micron Poly-Dimethyl Siloxane (PDMS) Replication Using Proton Beam Fabricated Nickel Moulds", Key Engineering Materials, Vols. 447-448, pp. 452-455, 2010