Electrostatic Control and the Need of Feedback Control Ionization in Critical Environment of MEMS Manufacturing Process

Abstract:

Article Preview

This paper describes new electrostatic control countermeasures and solutions for critical electrostatic control environment for MEMS manufacturing processes, especially in MEMS’s wafer handling that needs low electrostatic voltage. This includes personnel grounding methodology, ESD event measurement, and low ion imbalance ionization to support current and future needs of the MEMS.

Info:

Periodical:

Key Engineering Materials (Volumes 447-448)

Edited by:

Jianhong Zhao, Masanori Kunieda, Guilin Yang and Xue-Ming Yuan

Pages:

466-470

DOI:

10.4028/www.scientific.net/KEM.447-448.466

Citation:

A. Chakkaew and W. Titiroongruang, "Electrostatic Control and the Need of Feedback Control Ionization in Critical Environment of MEMS Manufacturing Process", Key Engineering Materials, Vols. 447-448, pp. 466-470, 2010

Online since:

September 2010

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.