Nanometer-Scale Characterization Technique for Si Nanoelectric Materials Using Synchrotron Radiation Microdiffraction

Shigeru Kimura; Yasuhiko Imai; Osamu Sakata; Akira Sakai

doi:10.4028/www.scientific.net/KEM.470.104

Paper Titles

Effect of Al₂O₃ Deposition and Subsequent Annealing on Passivation of Defects in Ge-Rich SiGe-on-Insulator
p.79

Controlled Synthesis of Carbon Nanowalls for Carbon Channel Engineering
p.85

Resistive Memory Utilizing Ferritin Protein with Nano Particle
p.92

Atomically Controlled Plasma Processing for Group IV Quantum Heterostructure Formation
p.98

Nanometer-Scale Characterization Technique for Si Nanoelectric Materials Using Synchrotron Radiation Microdiffraction
p.104

Generation and Growth of Atomic-Scale Roughness at Surface and Interface of Silicon Dioxide Thermally Grown on Atomically Flat Si Surface
p.110

Nano-Surface Modification of Silicon with Ultra-Short Pulse Laser Process
p.117

Evaluation of Strained Silicon by Electron Back Scattering Pattern Compared with Raman Measurement and Edge Force Model Calculation
p.123

Development of New Methods for Fine-Wiring in Si Using a Wet Catalytic Reaction
p.129

HomeKey Engineering MaterialsKey Engineering Materials Vol. 470Nanometer-Scale Characterization Technique for Si...

Nanometer-Scale Characterization Technique for Si Nanoelectric Materials Using Synchrotron Radiation Microdiffraction

Abstract:

We have developed new microdiffraction system at the SPring-8. This system uses a focused beam produced using a phase zone plate combined with a narrow slit, which makes a small focused beam that has a small angular divergence. Furthermore, we can use the two-dimensional x-ray CCD detector, which enable us to measure local reciprocal space maps at many points in a sample, that is, the distribution of strain fields and lattice tilts can be revealed in high-angular- and high-spatial-resolution.

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Periodical:

Key Engineering Materials (Volume 470)

Pages:

104-109

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.470.104

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Online since:

February 2011

Authors:

Shigeru Kimura, Yasuhiko Imai, Osamu Sakata, Akira Sakai

Keywords:

Interface, Micro Beam, Strain, Synchroton Radiation, Thin Film, X-Ray Diffraction (XRD)

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