Nanometer-Scale Characterization Technique for Si Nanoelectric Materials Using Synchrotron Radiation Microdiffraction

Abstract:

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We have developed new microdiffraction system at the SPring-8. This system uses a focused beam produced using a phase zone plate combined with a narrow slit, which makes a small focused beam that has a small angular divergence. Furthermore, we can use the two-dimensional x-ray CCD detector, which enable us to measure local reciprocal space maps at many points in a sample, that is, the distribution of strain fields and lattice tilts can be revealed in high-angular- and high-spatial-resolution.

Info:

Periodical:

Edited by:

Seiichi Miyazaki and Hitoshi Tabata

Pages:

104-109

DOI:

10.4028/www.scientific.net/KEM.470.104

Citation:

S. Kimura et al., "Nanometer-Scale Characterization Technique for Si Nanoelectric Materials Using Synchrotron Radiation Microdiffraction", Key Engineering Materials, Vol. 470, pp. 104-109, 2011

Online since:

February 2011

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Price:

$35.00

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