Self-Texture Control of ZnO Films Prepared by Reactive RF Magnetron Sputtering

Petr Novák; Pavol Šutta; M. Netrvalová; Jan Říha; Rostislav Medlín

doi:10.4028/www.scientific.net/KEM.605.219

Paper Titles

Preparation and Selectivity of Resistive Acetone Gas Sensors Based on Polyaniline/Au Interdigitated Electrode
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Investigation of a New High Sensitive Micro-Electromechanical Strain Gauge Sensor Based on Graphene Piezoresistivity
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The Development of FeMn₂O₄ Gas Sensors at Room Temperature
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Development of Novel Polymer Oxide Thick Film for Sensor Sensing Layers at Room Temperature
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Self-Texture Control of ZnO Films Prepared by Reactive RF Magnetron Sputtering
p.219

Optical Second Harmonic Generation as a Tool for In Situ, Real-Time Monitor of Thin Film Epitaxial Growth
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Analysis of CO and NH₃ Reductive Gases Mixture by Chemically Modified Nanocrystalline Tin Dioxide
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Effect of Crack Formation under Elongation in Carbon Nanotube Networks Embedded in Polyurethane
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Enhanced Electromechanical Properties of Carbon Nanotube/Polyurethan Composite by KMnO₄ Oxidation
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Self-Texture Control of ZnO Films Prepared by Reactive RF Magnetron Sputtering

Abstract:

Zinc Oxide (ZnO) is a wide bandgap semiconductor material which can be successfully used for wide variety of potential applications such as biosensors or acoustic resonator devices. ZnO normally crystallizes in the wurtzite structure with c-axis (001) preferred orientation. However, for bio-sensing in liquids, it is necessary to generate a shear horizontal mode wave, where the wave displacement is within the plane of the crystal surface. For generation of such a shear horizontal wave, a-axis film textures such as the (110) or (100) is necessary. This work is focused on the preferred orientation control of ZnO film prepared by RF magnetron sputtering. It is found that preferred orientation can be controlled by substrate bias and substrate temperature during deposition without the use of expensive crystalline substrates. There are three areas of operating parameters when the structure of the ZnO films is dominated by different preferred orientation. Moreover, the film annealing was performed to enhance the film structure.