The Influence of Pulse Width on Microstructure and Mechanical Properties of CrNx Coatings Deposited by HPPMS

Abstract:

CrNx coatings were deposited by high power pulse magnetron sputtering in a closed field unbalanced system. The influence of pulse width on microstructure and mechanical properties of CrNx coatings was examined. Morphologies different from those fabricated by traditional magnetron sputtering were obtained, phase structures were also changed in the process. The coatings hardness were always improved in the increasing pulse length, while the best adhension of CrNx coatings about 25N was get when pulse length was 60us.

• Periodical: Key Engineering Materials (Volume 633)
• Pages: 398-401
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.633.398
• Online since: November 2014
• Authors: Xiang Min Xu, Hao Zhang, Yi Bin Jin, Hao Chen Zhao, Shu Wang Duo
• Keywords: CrNx Coatings, HPPMS, Pulse Width

References

[1] Han Zeng-hu, Tian Jia -wan, Dai Jia-wei, et al., Preparation and mechanical properties of magnetron sputtered CrNx thin films, Journal of Functional Materials, 2002 33(5): 500-502.

[2] P.L. Ge, M.D. Bao, H.J. Zhang, K. You, X.P. Liu, Effect of plasma nitriding on adhesion strength of CrTiAlN coatings on H13 steels by closed field unbalanced magnetron sputter ion plating, Surf. Coat. Technol. 2013, 229: 146-150.

DOI: 10.1016/j.surfcoat.2012.08.002

[3] Z.L. Wu, J. Lin, J.J. Moore, M.K. Lei. Microstructure, mechanical and tribological properties of Cr–C–N coatings deposited by pulsed closed field unbalanced magnetron sputtering, Surf. Coat. Technol. 2009, 204: 931-935.

DOI: 10.1016/j.surfcoat.2009.04.032

[4] J.S. Chen , S.P. Lau, Y.B. Zhang, et al., Deposition of permalloy films by filtered cathodic vacuum arc, Thin Solid Films, 443(2003)115–119.

DOI: 10.1016/s0040-6090(03)01031-9

[5] B.J. Chen, X.W. Sun, B.K. Tay, Fabrication of ITO thin films by filtered cathodic vacuum arc deposition, Materials Science and Engineering B, 106(2004)300–304.

DOI: 10.1016/j.mseb.2003.09.046

[6] R.L. Boxman, V. Zhitomirsky, B. Alterkop, et al., Recent progress in filtered vacuum arc deposition, Surf. Coat. Technol. 86-87 (1996) 243-253.

DOI: 10.1016/s0257-8972(96)03023-x

[7] F. Liu, Y.D. Meng, Zh. X. Ren, et al., Characterization of ZrN flims deposited by ICP enhanced RF magnetron sputtering, Acta Physica Sinica, 2008 57(3) 1796-1801.

DOI: 10.7498/aps.57.1796

[8] F. Liu, Y.D. Meng, Zh. X. Ren, et al., Synthesization of ZrN films by inductively coupled plasma assisted RF magnetron sputtering, Chinese Journal of Vacuum Science and Technology, 2007 27(6) 526-530.

[9] Q.L. Fan, H.Y. Zhao, L.X. Song, et al., Reactive sputter deposition of nc-TiN/A-Si3N4 nanocomposite films in a magnetized inductively coupled plasma, Journal of Inorganic Materials, 2004 19(5)1080-1086.