[1]
K.F. Chiu, C.C. Chen, K.M. Lin, H.C. Lin, C.C. Lo, W.H. Ho, C.S. Jiang, Vacuum, 84 (2010) 1296-1301.
Google Scholar
[2]
B.J. Neudecker, N.J. Dudney, J.B. Bates, J Electrochem Soc, 147 (2000) 517-523.
Google Scholar
[3]
J.F. Whitacre, W.C. West, B.V. Ratnakumar, J Electrochem Soc, 150 (2003) A1676.
Google Scholar
[4]
L. Baggetto, R.A.H. Niessen, F. Roozeboom, P.H.L. Notten, Adv Funct Mater, 18 (2008) 1057-1066.
DOI: 10.1002/adfm.200701245
Google Scholar
[5]
L. Baggetto, H.C.M. Knoops, R.A.H. Niessen, W.M.M. Kessels, P.H.L. Notten, J Mater Chem, 20 (2010) 3703.
Google Scholar
[6]
M. Kotobuki, Y. Suzuki, H. Munakata, K. Kanamura, Y. Sato, K. Yamamoto, T. Yoshida, J Electrochem Soc, 157 (2010) A493.
DOI: 10.1149/1.3308459
Google Scholar
[7]
D. Golodnitsky, V. Yufit, M. Nathan, I. Shechtman, T. Ripenbein, E. Strauss, S. Menkin, E. Peled, J Power Sources, 153 (2006) 281-287.
DOI: 10.1016/j.jpowsour.2005.05.029
Google Scholar
[8]
P.R. Abel, A.M. Chockla, Y.M. Lin, V.C. Holmberg, J.T. Harris, B.A. Korgel, A. Heller, C.B. Mullins, Acs Nano, 7 (2013) 2249-2257.
DOI: 10.1021/nn3053632
Google Scholar
[9]
K. Yoshima, H. Munakata, K. Kanamura, J Power Sources, 208 (2012) 404-408.
Google Scholar
[10]
T. Ripenbein, D. Golodnitsky, M. Nathan, E. Peled, Electrochimica Acta, 56 (2010) 37-41.
DOI: 10.1016/j.electacta.2009.01.057
Google Scholar
[11]
T. Pichonat, C. Lethien, N. Tiercelin, S. Godey, E. Pichonat, P. Roussel, M. Colmont, P.A. Rolland, Mater. Chem. Phys., 123 (2010) 231-235.
DOI: 10.1016/j.matchemphys.2010.04.001
Google Scholar
[12]
C.S. Nimisha, K.Y. Rao, G. Venkatesh, G.M. Rao, N. Munichandraiah, Thin Solid Films, 519 (2011) 3401-3406.
DOI: 10.1016/j.tsf.2011.01.087
Google Scholar
[13]
N. Kuwata, J. Kawamura, K. Toribami, T. Hattori, N. Sata, Electrochem Commun, 6 (2004) 417-421.
Google Scholar