Milling of Dielectric Ceramics by Fast Argon Atoms

Abstract:

A new method for dielectric materials milling has been developed. Instead of well-known ion milling used for metals the dielectrics were processed by broad beams of fast argon atoms. The fast atoms were produced due to charge exchange collisions of accelerated ions. Plasma emitter of the ions was generated in hollow cathode glow discharge. Emissive grid of a circular cross-section beam source consisted of six segments. Energy of the fast atoms ranged from 1 to 3 keV. The beam source was used for production of contoured grooves on flat surfaces of hard ceramic materials. On the surface of movable seal ring made of α-corundum were produced grooves with depth of 20±0.5 μm and roughness of R_a ≈ 0.4 µm. The rate of α-corundum etching amounted to 3 μm/h.

• Periodical: Key Engineering Materials (Volume 723)
• Pages: 329-334
• DOI: https://doi.org/10.4028/www.scientific.net/KEM.723.329
• Online since: December 2016
• Authors: Sergei Grigoriev*
• Keywords: Ceramic Materials, Contoured Grooves, Etching, Fast Argon Atoms

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