Stress Reduction of Solar Cell with Nanostructures on Silicon Chip Surface

Article Preview

Abstract:

Silicon chip has been widely used in solar cell recently. The thinning of silicon chip, easily inducing surface defects, becomes necessary to produce solar cells more efficiently. The surface defects resulting in stress concentration on the silicon chip surface would be the source of chip failure. In this study, the finite element analysis was used to investigate the stress distribution near the surface crack of a solar cell on which the nanostructures were introduced to alleviate the induced stress. For the solar cell model, positive silver and negative aluminum electrodes were added on the top and bottom sides of silicon chip. The solar cell under four-point bending was simulated in analysis with and without nanostructures. The results show that the stresses reduce more than 50 % for the solar cell model with nanostructures. When the crack depth is deeper enough, the stress at crack tip is higher than that at junction near the electrode and the crack leads to the failure of solar cell. The effect of different section length of nanostructures on the stress distribution caused by the surface crack was also discussed.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

476-480

Citation:

Online since:

December 2016

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2017 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

* - Corresponding Author

[1] J. Lee, N. Lakshminarayan, S. Dhungel, K. Kim, J. Yi, Optimization of fabrication process of high-efficiency and low-cost crystalline silicon solar cell for industrial applications, Sol. Energy Mater. Solar Cells, 93(2) (2009) 256-261.

DOI: 10.1016/j.solmat.2008.10.013

Google Scholar

[2] C. Sun, W. Fan, C. Cheng, C. Lin, K. Huang, Templated fabrication of large area subwavelength antireflection gratings on silicon, Appl. Phys. Lett. 91 (2007) 231105.

Google Scholar

[3] H. Chen, W. Fan, C. Chen, C. Lin, K. Huang, Fabrication of texturing antireflection structures in solar cells by using the defocusing exposure in optical lithography, J. Electrochem. Soc. 153(9) (2006) G802-G806.

DOI: 10.1149/1.2213567

Google Scholar

[4] Z. Xi, D. Yang, W. Dan, C. Jun, X. Li, D. Que, Texturization of cast multicrystalline silicon for solar cells, Semicond. Sci. Technol. 19(3) (2004) 485-489.

DOI: 10.1088/0268-1242/19/3/035

Google Scholar

[5] E. Vazsonyi, K. De Clercq, R. Einhaus, E. Van Kerschaver, K. Said, J. Poortmans, J. Szlufcik, J. Nijs, Improved anisotropic etching process for industrial texturing of silicon solar cells, Sol. Energy Mater. Sol. Cells, 57(2) (1999) 179-188.

DOI: 10.1016/s0927-0248(98)00180-9

Google Scholar

[6] W. Guter, J. Schone, S. Philipps, M. Steiner, G. Siefer, A. Wekkeli, E. Welser, E. Oliva, A. Bett, F. Dimroth, Current-matched triple-junction solar cell reaching 41. 1% conversion efficiency under concentrated sunlight, Appl. Phys. Lett. 94 (2009).

DOI: 10.1063/1.3148341

Google Scholar

[7] K. Munzer, K. Holderman, R Schlosser, S. Sterk, Thin monocrystalline silicon solar cells, IEEE T. Electron Devices, 46 (1999) 2055-(2061).

DOI: 10.1109/16.791996

Google Scholar

[8] C. N. Chen, Strengthening of Single Crystal Silicon by Mimicking the Surface Nanostructures on Cicada's Wing, Doctor Dissertation, National Tsing Hua University, Hsinchu, Taiwan (2008).

Google Scholar

[9] M. K. Yeh, Y. K. Shao, C. Hsu, Stress concentration reduction at crack tip by adding nanonotches on chip surface, Procedia Eng. 79 (2014) 225–229.

DOI: 10.1016/j.proeng.2014.06.335

Google Scholar

[10] M. K. Yeh, Y. K. Shao, J. A. Yeh, C. Hsu, Stress distribution affected by nano-structures near surface crack on silicon chip, Acta Mechanica, (2015) 1-7 (on Line, 24 December 2015).

DOI: 10.1007/s00707-015-1516-y

Google Scholar

[11] C. J. Wilson, A. Ormeggi, M. Narbutoskih, Fracture testing of silicon microcantilever beams, J. Appl. Phys. 79 (1996) 2386-2393.

DOI: 10.1063/1.361102

Google Scholar

[12] ANSYS Release 12. 1, ANSYS Inc., Canonsburg, PA (2009).

Google Scholar