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HomeKey Engineering MaterialsKey Engineering Materials Vol. 787V-Defect and Dislocation Analysis in InGaN...

V-Defect and Dislocation Analysis in InGaN Multiple Quantum Wells on Patterned Sapphire Substrate

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Abstract:

InGaN/GaN multiquantum well (MQW) structures have been grown on cone-shaped patterned sapphire substrates (CPSS) by metalorganic chemical vapor deposition (MOCVD). From the transmission electron microscopy (TEM) results, we found that most of the threading dislocations (TDs) in the trench region of the CPSS were bent by lateral growth mode. Also the staircase-like TDs were observed near the slant region of the cone pattern, they converged at the slope of the cone patterned region by staircase-upward propagation, which seems to effectively prevent TDs from vertical propagation in the trench region. The associated dislocation runs up into the overgrown GaN layer and MQW, and some (a+c) dislocations were shown to decompose inside the multi-quantum well, giving rise to a misfit segment in the c-plane and a V-shape defect. From cross-sectional TEM, we found that all V defects are not always connected with TDs at their bottom, some V defects are generated from the stacking mismatch boundaries induced by stacking faults which are formed within the MQW due to the strain relaxation.

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Periodical:

Key Engineering Materials (Volume 787)

Pages:

37-41

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.787.37

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Online since:

November 2018

Authors:

Huan You Wang, Qiao Lai Tan, Gui Jin*

Keywords:

InGaN Multi-Quantum Well (MQW), Threading Dislocations (TDs), Transmission Electron Microscopy (TEM), V Defects

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© 2018 Trans Tech Publications Ltd. All Rights Reserved

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