Measurement of Interstitial Oxygen Striations in Silicon Single Crystals Using the Micro-FTIR Method

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Periodical:

Materials Science Forum (Volumes 117-118)

Edited by:

Tsunemasa Taguchi

Pages:

189-194

DOI:

10.4028/www.scientific.net/MSF.117-118.189

Citation:

E. Iino et al., "Measurement of Interstitial Oxygen Striations in Silicon Single Crystals Using the Micro-FTIR Method ", Materials Science Forum, Vols. 117-118, pp. 189-194, 1993

Online since:

January 1993

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$35.00

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