Characterization of Impurities in Si(C2H5O)4 for Efficient SiO2 Production in ULSI Technology

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Periodical:

Materials Science Forum (Volumes 117-118)

Edited by:

Tsunemasa Taguchi

Pages:

527-0

DOI:

10.4028/www.scientific.net/MSF.117-118.527

Citation:

T. Danno and K. Seki, "Characterization of Impurities in Si(C2H5O)4 for Efficient SiO2 Production in ULSI Technology ", Materials Science Forum, Vols. 117-118, pp. 527-0, 1993

Online since:

January 1993

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