X-Ray Diffraction Studies and Ellipsometric Diagnostics of Thin α-Ti Growth Films in Plasma Activated Physical Vapour Deposition

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Periodical:

Materials Science Forum (Volumes 166-169)

Edited by:

R. Delhez and E.J. Mittemeijer

Pages:

313-318

DOI:

10.4028/www.scientific.net/MSF.166-169.313

Citation:

H. Wulff et al., "X-Ray Diffraction Studies and Ellipsometric Diagnostics of Thin α-Ti Growth Films in Plasma Activated Physical Vapour Deposition", Materials Science Forum, Vols. 166-169, pp. 313-318, 1994

Online since:

July 1994

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$35.00

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