Logarithmic Kinetics of the Ion Charge Accumulation in the SiO2 Dielectric Layers

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Periodical:

Materials Science Forum (Volumes 185-188)

Edited by:

K.E. Heusler

Pages:

591-600

DOI:

10.4028/www.scientific.net/MSF.185-188.591

Citation:

V.N. Ovsyuk "Logarithmic Kinetics of the Ion Charge Accumulation in the SiO2 Dielectric Layers", Materials Science Forum, Vols. 185-188, pp. 591-600, 1995

Online since:

March 1995

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$35.00

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