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HomeMaterials Science ForumMaterials Science Forum Vols. 228-231Analysis of Residual Stress Gradients in Thin...

Analysis of Residual Stress Gradients in Thin Films Using SEEMANN-BOHLIN-X-Ray Diffraction

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Periodical:

Materials Science Forum (Volumes 228-231)

Pages:

301-306

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.228-231.301

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Online since:

July 1996

Authors:

K. Fischer, H. Oettel

Keywords:

Arc Evaporation, Electrical Contact, Hard Coating, Magnetron Sputtering, Residual Stress, SEEMANN-BOHLIN-Focusing, Thin Film, Titanium Nitride, X-Ray Diffraction (XRD)

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© 1996 Trans Tech Publications Ltd. All Rights Reserved

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