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HomeMaterials Science ForumMaterials Science Forum Vols. 264-268Thermal Stability of Sputtered TiN as Metal Gate...

Thermal Stability of Sputtered TiN as Metal Gate on 4H-SiC

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Periodical:

Materials Science Forum (Volumes 264-268)

Pages:

805-808

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.264-268.805

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Online since:

February 1998

Authors:

Erik Danielsson, Chris I. Harris, Carl Mikael Zetterling, Mikael Östling

Keywords:

C-V Measurement, Gate Metal, MOS, Thermal Stability, Titanium Nitride TiN

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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