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HomeMaterials Science ForumMaterials Science Forum Vols. 338-342Plasma Enhanced Chemical Vapor Deposition and...

Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si

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Silicon Carbide and Related Materials - 1999

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Periodical:

Materials Science Forum (Volumes 338-342)

Pages:

325-328

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.338-342.325

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Online since:

May 2000

Authors:

Yi Hua Wang, Jian Yi Lin, Zhe Chuan Feng, Soo Jin Chua, Cheng Hon Huan Alfred

Keywords:

Amorphous Silicon Carbide, PECDV, Photoluminescence (PL), Raman Spectroscopy

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© 2000 Trans Tech Publications Ltd. All Rights Reserved

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