Thin Films of α-Si1-xCx:H Deposited by PECVD: The r.f. Power and H2 Dilution Role

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Periodical:

Materials Science Forum (Volumes 338-342)

Edited by:

Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer

Pages:

329-334

DOI:

10.4028/www.scientific.net/MSF.338-342.329

Citation:

R.J. Prado et al., "Thin Films of α-Si1-xCx:H Deposited by PECVD: The r.f. Power and H2 Dilution Role", Materials Science Forum, Vols. 338-342, pp. 329-334, 2000

Online since:

May 2000

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