Novel Thermal Donors Generated in Cz Silicon by Prolonged Annealing at 470° C

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Periodical:

Materials Science Forum (Volumes 38-41)

Edited by:

G. Ferenczi

Pages:

673-678

DOI:

10.4028/www.scientific.net/MSF.38-41.673

Citation:

Y. Kamiura et al., "Novel Thermal Donors Generated in Cz Silicon by Prolonged Annealing at 470° C", Materials Science Forum, Vols. 38-41, pp. 673-678, 1989

Online since:

January 1991

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