Influence of Silicide Growth on the Formation Rate of Thermal Donors in Silicon

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 38-41)

Edited by:

G. Ferenczi

Pages:

649-654

DOI:

10.4028/www.scientific.net/MSF.38-41.649

Citation:

D. Mathiot "Influence of Silicide Growth on the Formation Rate of Thermal Donors in Silicon", Materials Science Forum, Vols. 38-41, pp. 649-654, 1989

Online since:

January 1991

Authors:

Export:

Price:

$35.00

In order to see related information, you need to Login.