New Thermal Donors and Processes Associated with Oxygen Clustering in Cz-Si at 600° C

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Periodical:

Materials Science Forum (Volumes 38-41)

Edited by:

G. Ferenczi

Pages:

667-672

DOI:

10.4028/www.scientific.net/MSF.38-41.667

Citation:

K. Schmalz et al., "New Thermal Donors and Processes Associated with Oxygen Clustering in Cz-Si at 600° C", Materials Science Forum, Vols. 38-41, pp. 667-672, 1989

Online since:

January 1991

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