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Effect of UV Illumination on Deposition of Low-k Si-O-C(-H) Films by PECVD

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Abstract:

The characteristics of plasma are important for the deposition of SiOC(-H) low dielectric thin film. The effect of UV light illumination on the plasma parameter in the capacitive coupled plasma chemical vapor deposition (CCP-CVD) system is investigated. The electron density is almost not changed, but the electron temperature decreases by UV light illumination. The deposition rate increases and the dielectric constant of the film is lowered with UV light.

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Periodical:

Materials Science Forum (Volumes 449-452)

Pages:

473-476

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.449-452.473

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Online since:

March 2004

Authors:

Heon Ju Lee, Chang Sil Yang, Chi Kyu Choi

Keywords:

Low Dielectric Constant, Plasma CVD, Trimethylsilane (TMS), UV Illumination

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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References

[1] M. Morgen, E. Todd, J. H. Zhao, C. Hu, T. Cho and P. S. Ho: Annu. Rev. Mater. Sci. Vol. 30 (2000), p.651.

Google Scholar

[2] J. H. Kim, S. H. Seo, S. M. Yun, H. Y. Chang, K. M. Lee and C. K. Choi: Appl. Phys. Lett. Vol. 68 (1996), p.1507.

Google Scholar

[3] A. Gill and V. Patel: J. Appl. Phys. Vol. 85 (1999), p.6.

Google Scholar

[4] K. Endo, K. Shinoda and T. Tatsumi: J. Appl. Phys. Vol. 86 (1999), p.2739.

Google Scholar

[5] C. S. Yang, K. S. Oh, J. Y. Ryu, D. C. Kim, S. Y. Jing, C. K. Choi, H. J. Lee, S. H. Um and H. Y. Chang: Thin Solid Films Vol. 390 (2001), p.113.

Google Scholar

[6] Nigel P. Hacker: MRS. Bulletin Vol. 22 (1997), p.33.

Google Scholar

[7] Y. H. Kim, S. K. Lee and H. J. Kim: J. Vac. Sci. Technol. Vol. A18 (2000), p.1216.

Google Scholar

[8] S. Y. Jing, H. J. Lee and C. K. Choi: J. Korean Phys. Soc. Vol. 41 (2002), p.769.

Google Scholar

[9] H. J. Lee and C. K. Choi: J. Korean Phys. Soc. Vol. 43 (2003).

Google Scholar

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