Optimisation of a Home-Made RIE System - Effect of SF6 Plasma on the Properties of Partially Etched a-Si:H Films

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Periodical:

Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

124-127

Citation:

P. Pereira et al., "Optimisation of a Home-Made RIE System - Effect of SF6 Plasma on the Properties of Partially Etched a-Si:H Films", Materials Science Forum, Vols. 455-456, pp. 124-127, 2004

Online since:

May 2004

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$38.00

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