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HomeMaterials Science ForumMaterials Science Forum Vols. 455-456Optimisation of a Home-Made RIE System - Effect of...

Optimisation of a Home-Made RIE System - Effect of SF₆ Plasma on the Properties of Partially Etched a-Si:H Films

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Advanced Materials Forum II

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Periodical:

Materials Science Forum (Volumes 455-456)

Pages:

124-127

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.455-456.124

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Online since:

May 2004

Authors:

P. Pereira, G. Lavareda, A.M. Botelho do Rego, A. Amaral, C. Nunes de Carvalho

Keywords:

Amorphous Silicon a-Si:H, Plasma Etching, Scanning Electron Microscope (SEM), Sulphur Hexafluoride SF₆, X-Ray Photoelectron Spectroscopy (XPS)

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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